SAMCO Inc.

Headquartered in Kyoto, Japan, SAMCO Inc. (founded in 1979 and renamed from SAMCO International, Inc. in December 2004) operates as a leading semiconductor and materials technology company. Its core business involves the development and sale of advanced equipment for thin film deposition, microfabrication, cleaning, and surface treatment. Their product portfolio includes various deposition systems, such as anode and cathode plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD), and silicon carbide (SiC) chemical vapor deposition (CVD) technologies. The company's etching solutions encompass reactive ion etching (RIE) systems, multiple inductively coupled plasma (ICP) etchers (for general applications, SiC, and batch processing), silicon deep reactive ion etching, and xenon difluoride (XeF2) etch systems, particularly for MEMS release. For cleaning, SAMCO offers plasma, remote source plasma, and UV-ozone cleaners, alongside fundamental plasma research kits. These sophisticated products cater to diverse high-tech markets, including micro-electromechanical systems (MEMS), laser diodes, high-brightness LEDs, through-silicon vias (TSV), surface acoustic wave (SAW) devices, and radio frequency (RF) devices.

CEO: Osamu Tsuji - https://www.samcointl.com